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Thursday, September 09, 2004

"NANOTECH: Researchers demonstrate nanoscale self-assembly"
A new processing technique developed by Cornell University researchers promises to usher in lithographic-like self-assembly into single and multidimensional nanoscale structures. The technique enabled 10-nm precision lithography. One-, two- and three-dimensional nanoscale structures self-assembled by combining a block copolymer with a "cascade molecule" called a dendrimer in which atoms are arrayed along a carbon backbone, the researchers said. "We demonstrated 10-nanometer feature sizes, but we envision our invention working with traditional lithography to encode information into a material that enables it to self-assemble into domains with angstrom-scale precision," said Ulrich Wiesner, professor of materials science and engineering at Cornell University. Besides subnanoscale precision lithography, the researchers said their invention could lead to ultraprecise nanoscale features that improve the efficiency of batteries, solar cells and fuel cells.
Text: http://www.eet.com/article/showArticle.jhtml?articleId=47101871