"CHIPS: Lithography leap creates 20-nm chip features"
Professor James Taylor at the University of Wisconsin describes a way to create 20-nanometer chip feature sizes with 100-nm masks, giving an unexpected leap to Moore's Law and possibly extending the life of current lithography. The so-called "bright-peak technology" adjusts the phase of X-ray lithography to control diffraction � a technique that works for X-rays or even traditional optical lithography.
Audio Interview / Interview on CD
Text: http://www.eet.com/at/news/OEG20030117S0038