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Tuesday, September 09, 2003

"CHIPS: Modeling tools aid in immersion lithography quest"
A German company is fielding modeling tools that can help chip makers assess the promise of immersion lithography. Putting a layer of water between a wafer and the stepper lens could extend current 193-nanometer lithographic exposure tools down to the 45-nm chip-manufacturing node and below, experts believe.
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Text: http://www.eetimes.com/story/OEG20030908S0054