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Friday, January 31, 2003

"NANOSCALE: waveguides provide view of single molecules"
Michael Levene describes how researchers at Cornell University perforated the top layer of a chip with two million "holes" that serve as nanoscale waveguides for a 488-nanometer laser, allowing them to film individual molecules during chemical reactions.
Audio Interview / Interview on CD
Text: http://www.eet.com/at/news/oe/OEG20030131S0022

Tuesday, January 28, 2003

"SMART DUST: Companies test prototype wireless-sensor nets"
Professor David Culler describes how self-organizing wireless-sensor networks, a realization of the Pentagon's "smart-dust" concept, have reached the prototype stage worldwide. The smart sensors, or Motes, were created by the University of California at Berkeley and Intel, and are being tested out worldwide today.
Audio Interview / Interview on CD
Text: http://www.eet.com/at/news/OEG20030128S0028

Wednesday, January 22, 2003

"FEDERATION: Remote labs team up to simulate astronaut's heart"
Independent computer simulations running hundreds of miles apart have been harnessed to create a single, interacting supersimulation of the right and left ventricles of an astronaut's heart. The simulation tied together work done in separate labs, and represented the first successful U.S. application of an IEEE standard for organizing independent, distributed simulations into a larger, single simulation, called a federation.
Text: http://www.eet.com/at/news/OEG20030121S0047

Friday, January 17, 2003

"CHIPS: Lithography leap creates 20-nm chip features"
Professor James Taylor at the University of Wisconsin describes a way to create 20-nanometer chip feature sizes with 100-nm masks, giving an unexpected leap to Moore's Law and possibly extending the life of current lithography. The so-called "bright-peak technology" adjusts the phase of X-ray lithography to control diffraction � a technique that works for X-rays or even traditional optical lithography.
Audio Interview / Interview on CD
Text: http://www.eet.com/at/news/OEG20030117S0038

Tuesday, January 14, 2003

"NASA recruits robotics, sensors for Mars Scout mission"
Joel Levine, NASA scientist, describes the Ares unmanned flyer--one of four proposals NASA is considering for its planned Mars Scout mission slated for 2007. Ares would include robotics technology, flight instrumentation and cameras to record data that can be relayed back to Earth.
Audio Interview / Interview on CD
Text: http://www.eet.com/at/news/OEG20030114S0020

Tuesday, January 07, 2003

"ROBOTS: Sensitive robots taught to gauge human emotion"
Engineer Nilanjan Sarkars is working with psychologist Craig Smith at Vanderbilt University to improve human-machine interfaces by teaching robots to sense human emotions. Such "sensitive" robots would change the way they interact with humans based on an evaluation of a person's mood.
Text: http://www.eet.com/at/news/OEG20030107S0033
"INTERNET: System permits long-distance manipulation of image files"
Team leader Lyndon Pierson describes a remote viewing system being developed at Sandia National Laboratories which llows an image of any size to be interactively visualized and manipulated over the Internet without transferring the file from its secured server. The system � "Be There Now" � is said to save download time on large files and keep sensitive files secure.
Text: http://www.eet.com/at/news/OEG20030106S0053

Monday, January 06, 2003

"EXTREME-UV: Researchers improve tabletop EUV laser"
Professors Margaret Murnane and Henry Kapteyn at the University of Colorado have boosted the output power and reduced the beam wavelength of their tabletop extreme ultraviolet (EUV) laser system built with off-the-shelf components without altering its $5,000 cost, opening the system to a new range of possible applications, including nanoscale chip lithography and microscopy. By modifying their previous tabletop EUV system, the researchers increased the system's output power from 100 watts to 1 megawatt, and downsized the wavelength of its laser beam from 30 nanometers to 7 nm, making it applicable to 13 nm lithography and microscopy.
Text: http://www.eet.com/at/news/OEG20030103S0061