#CHIPS: "Immersion litho still beating EUV"

Repeated predictions about the end-of-the-road for semiconductor immersion lithography have been greatly exaggerated. In fact, the current lithographic techniques may be good enough to last all the say to additive self assembly for the next generation: R. Colin Johnson @NextGenLog

Light at 193 nm has a resolution limit on the order of 65 nm, but immersion lithography uses the same light source and yet realizes a semiconductor process at precisions as high as 40-45nm. (Source: Nikon)
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