Further ReadingMulti-gate 3-D FinFETs will be an essential element in achieving the 14 nanometer process technology node, according to IBM research scientist James Warnock.
Wednesday, March 27, 2013
#ISPD: "Next Generation Chips Face Hurtles"
Even though Intel has already proven it is possible, the FinFET technology its perfected is years away for competitors who detailed the hurtles they face at the International Symposium on Physical Systems: R. Colin Johnson @NextGenLog
Further ReadingMulti-gate 3-D FinFETs will be an essential element in achieving the 14 nanometer process technology node, according to IBM research scientist James Warnock. Further Reading
Further ReadingMulti-gate 3-D FinFETs will be an essential element in achieving the 14 nanometer process technology node, according to IBM research scientist James Warnock.