A new, cheaper laser light source for extreme ultraviolet (EUV) lithography has been patented by the University of California at San Diego (UCSD) in cooperation with Cymer Inc.--a maker of laser illumination sources for photolithography systems.
By demonstrating that less expensive lasers using long, rather than the usual ultra-short pulses, the researchers hope to pave the way to EUV lithography beyond the 32-nanometer node.
Text: http://www.eetimes.com/showArticle.jhtml?articleID=208808743
