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Thursday, August 26, 2010

#Graphene Fabrication Boosted by National Lab

Oak Ridge National Lab says they have found a way to fabricate perfect carbon sheets--graphene--for next generation semiconductors. Look for chip manufacturers to make the transition from silicon- to carbon-based electronics over the rest of the decade. RColinJohnson @NextGenLog


ORNL simulations demonstrate how loops (blue) between graphene layers can be minimized using electron irradiation (bottom).

Here is what EETimes says about graphene: Graphene, which promises to solve many problems as silicon design rules approach the atomic scale, performs better when these pure carbon devices are made smaller. The catch is that at the nanoscale level, features must have atomic accuracy, including near perfect edges and monolayers. The Energy Department's Oak Ridge National Laboratory is creating a set of tools for fabricating perfect graphene sheets, including the recent finding that electron irradiation prevents connections between monolayers...
Full Text: http://bit.ly/NextGenLog-bqMy